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This is a superb state-of-the-art collection of contributed readings by nationally recognized authorities in VLSI technology. The emphasis of this text is on fabrication.
| List of Contributors | ||
| Preface | ||
| Introduction | 1 | |
| 1 | Crystal Growth and Wafer Preparation | 9 |
| 2 | Epitaxy | 55 |
| 3 | Oxidation | 98 |
| 4 | Lithography | 141 |
| 5 | Reactive Plasma Etching | 184 |
| 6 | Dielectric and Polysilicon Film Deposition | 233 |
| 7 | Diffusion | 272 |
| 8 | Ion Implantation | 327 |
| 9 | Metallization | 375 |
| 10 | Process Simulation | 422 |
| 11 | VLSI Process Integration | 466 |
| 12 | Analytical Techniques | 516 |
| 13 | Assembly Techniques and Packaging of VLSI Devices | 566 |
| 14 | Yield and Reliability | 612 |
| App. A Properties of Silicon at 300 K | 656 | |
| App. B List of Symbols | 658 | |
| App. C International System of Units | 660 | |
| App. D Physical Constants | 661 | |
| Index | 662 |
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